Profile & Philosophy

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AXT, Inc.

VGF Strength. Performance. Innovation.

AXT, Inc. designs, develops, manufactures and distributes high-performance compound semiconductor substrates. Our customers use our products to fabricate integrated circuits for electronic systems that operate the latest fiber optic communications, wireless communications and lighting display applications. Although our process and products are complex and technically sophisticated, our value message is elegantly straightforward - as expressed by our tagline's three AXT VGF attributes. They are:

Strength: Twenty years ago, we pioneered the commercialization of vertical gradient freeze, or VGF technology for manufacturing compound semiconductor substrates. Our proprietary VGF crystal growth process technology produces substrates with competitive sustainable advantages such as lower etch pit density (EPD) compared with conventional methods, lower stress, and the greatest mechanical strength, so that our customers experience less breakage and attain higher yields. In addition, our new management team, under the direction of Dr. Morris Young, CEO, represents strength in knowledge and experience, reflecting more than 120 years of achievement in the semiconductor industry.

Performance:
Our customers that manufacture LEDs, electronic devices for switches and power amplifiers, and laser diodes report that our substrates' low defect rate and material strength simply outperform other manufacturers' substrates. Our VGF technology achieves excellent  diameter control, outstanding radial symmetry, low axial and radial temperature gradient, and excellent thermal dynamic stability. These advantages result in ultra-thin wafers greater than or equal to 100 microns, without the need for backside lapping after epitaxy. We also perform for customers by offering off-orientation wafers, made to order, such as 110, (111)A, and (111)B.

Innovation:
AXT was the first company to commercialize VGF technology in the industry. We have continued our track record of innovation as the first company to introduce 6-inch-diameter substrates produced using VGF technology. And today, we remain the only company to manufacture germanium substrates using VGF technology. Our substrate manufacturing facility in Beijing is the largest in the world. In addition to innovations in new products for the marketplace, we are also advancing our ability to be the market's lowest cost producer. We are currently developing new crystal growth furnaces to shorten growth time, increasing our crystal length. We are also adding state-of-the-art equipment for process control and material characterization. From a business perspective, we are the first company in our industry to establish raw material joint ventures in China. Today we have five new joint ventures, through which we offer raw materials such as Ga-4N, 6N, and 7N, Ge, As-4N, 6N, and 7N, pBN  components, crucibles, and other related MBE parts. In addition, we pioneer better ways to support customers with greater responsiveness, such as offering consignment for their spot business opportunities, or meeting regularly with customers' marketing and technical people to match our material development with their product plans, so that we can decrease their time to market.

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